Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This note presents improved approximation guarantees for the requirement cut problem: given an n-vertex edge-weighted graph G=(V,E), and g groups of vertices X1,...,Xg ⊆ V with each group Xi having a requirement ri between 0 and |Xi|, the goal is to find a minimum cost set of edges whose removal separates each group Xi into at least ri disconnected components. We give a tight Θ(logg) approximation ratio for this problem when the underlying graph is a tree, and show how this implies an O(logk·logg) approximation ratio for general graphs, where k=|∪gi=1=1gXi|≤n. © 2010 Elsevier B.V. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
M.B. Small, R.M. Potemski
Proceedings of SPIE 1989
John S. Lew
Mathematical Biosciences
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011