Confinement effects on the spatial extent of the reaction front in ultrathin chemically amplified photoresists
- Darío L. Goldfarb
- Marie Angelopoulos
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Characterization of iodoheptafluoropropane as a dielectric etchant. I. Process performance evaluation
- Simon Karecki
- Ritwik Chatterjee
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Field-based scanning tunneling microscope manipulation of antimony dimers on Si(001)
- S. Rogge
- R.H. Timmerman
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Pattern characterization of deep-ultraviolet photoresists by near-field infrared microscopy
- Bogdan Dragnea
- Jan Preusser
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Development of 157 nm positive resists
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Hot carrier transport effects in Al2O3-based metal-oxide-semiconductor structures
- R. Ludeke
- M.T. Cuberes
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
- S.M. Rossnagel
- A. Sherman
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Comparative study of self-aligned and nonself-aligned SiGe p-metal-oxide-semiconductor modulation-doped field effect transistors with nanometer gate lengths
- Wu Lu
- Steven J. Koester
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse
- Darío L. Goldfarb
- Juan J. De Pablo
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures