Fabrication Processes for a Silicon Substrate Package for Integrated Gallium Arsenide Laser ArraysMichael J. Brady2019JES
Preparation and Electrical Properties of V2O3 Single Crystals of Controlled StoichiometryS.A. ShivashankarR. Aragónet al.2019JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorrA. RayA. Reisman2019JES
Control of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power DensityR.S. Horwath2019JES