Polyaniline: A Very Fast Electrochromic Material
- J.C. Lacroix
- K.K. Kanazawa
- et al.
- 2019
- JES
Publications
14338 results for Physical Sciences
Energy Considerations in the Deposition of High-Quality Plasma-Enhanced CVD Silicon Dioxide
- E. Tierney
- J. Batey
- et al.
- 2019
- JES
A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
A Study of Luminescent Centers in Reactive-Ion-Etched Silicon
- T.D. Bestwick
- G.S. Oehrlein
- et al.
- 2019
- JES
The Ion Sensitivity of Boron Implanted Silicon Nitride Chemical Sensors
- Yin Hu
- Marvin H. White
- 2019
- JES
Near-Surface Damage and Contamination after CF4/H2 Reactive Ion Etching of Si
- G.S. Oehrlein
- R.M. Tromp
- et al.
- 2019
- JES
Combined Experimental and Modeling Study of Spatial Effects in Plasma Etching: CF4/O2 Etching of Silicon
- M. Dalvie
- K.F. Jensen
- 2019
- JES
Photochemically Generated Gold Catalyst for Selective Electroless Plating of Copper
- Thomas H. Baum
- 2019
- JES
Reactive Ion Etching in SF6 Gas Mixtures
- R. Pinto
- R.S. Babu
- 2019
- JES
Electrochemistry of Polysilanes with Bound Ferrocene
- Art Diaz
- Mark Seymour
- et al.
- 2019
- JES