The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
Publications
14361 results for Physical Sciences
High Temperature Flow Resistance of Micron Sized Images in AZ Resists
- H. Hiraoka
- J. Pacansky
- 2019
- JES
Anodic Etching of Defects in P-Type Silicon
- H. Föll
- 2019
- JES
Plasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES
Controlled Collapse Reflow for Josephson Chip Bonding
- C.-Y. Ting
- K.R. Grebe
- et al.
- 2019
- JES
Reversal of Relative Oxidation Rates of <111> and <100> Oriented Silicon Substrates at Low Oxygen Partial Pressures
- S.I. Raider
- L.E. Forget
- et al.
- 2019
- JES
Dry Etching for VLSI—A Review
- L.M. Ephrath
- 2019
- JES
Predicting Radiation Sensitivity of Polymers
- C.G. Willson
- K. Kinoshita
- 2019
- JES
Luminescence of Silica Glasses Containing Copper
- J.M. Brownlow
- I.F. Chang
- 2019
- JES
On Fitting Error Functions to Data
- R. Ghez
- M.B. Small
- 2019
- JES