Simulation of surface topography evolution during plasma etching by the method of characteristics
- Manoj Dalvie
- Satoshi Hamaguchi
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Infrared absorption spectroscopy for monitoring condensible gases in chemical vapor deposition applications
- James A. O'neill
- Michael L. Passow
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperModel of Lead Loss in Pb(MgxNb1-x)Ozion Beam Sputtered Thin Films
- J.P. Doyle
- J.J. Cuomo
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperTribochemistry at Lubricated Interfaces
- Xiaohe Pan
- C.S. Bhatia
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperFluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperFluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
- G.S. Oehrlein
- Y. Zhang
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperMorphology and bonding measured from boron-nitride powders and films using near-edge x-ray absorption fine structure
- T. Sato
- A. Chaiken
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperSi(100)2-1+Sb surfaces studied with photoemission and optical spectroscopy
- H. Bernhoff
- D. Purdie
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperRole of ions in reactive ion etching
- J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperFluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases
- Gottlieb S. Oehrlein
- Ying Zhang
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paper