Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Directed sputter deposition of AlCu: Film microstructure and microchemistry
- S.M. Rossnagel
- J. Moser
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperModel of Lead Loss in Pb(MgxNb1-x)Ozion Beam Sputtered Thin Films
- J.P. Doyle
- J.J. Cuomo
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperTribochemistry at Lubricated Interfaces
- Xiaohe Pan
- C.S. Bhatia
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperInfrared absorption spectroscopy for monitoring condensible gases in chemical vapor deposition applications
- James A. O'neill
- Michael L. Passow
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperDeposition of aluminum oxide films with high refractive index
- K.K. Shih
- D.B. Dove
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperReactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas
- O. Joubert
- G.S. Oehrlein
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperSi(100)2-1+Sb surfaces studied with photoemission and optical spectroscopy
- H. Bernhoff
- D. Purdie
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperQuantum size effects in ultrathin Cu(100) films
- G.J. Mankey
- R.F. Willis
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperRole of ions in reactive ion etching
- J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paper