Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma
- M. Surendra
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Tribochemistry at Lubricated Interfaces
- Xiaohe Pan
- C.S. Bhatia
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Adhesion durability of tantalum BPDA-PDA polyimide interfaces
- D. Neuaroschl
- B.K. Furman
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Model of Lead Loss in Pb(MgxNb1-x)Ozion Beam Sputtered Thin Films
- J.P. Doyle
- J.J. Cuomo
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Directed sputter deposition of AlCu: Film microstructure and microchemistry
- S.M. Rossnagel
- J. Moser
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Si(100)2-1+Sb surfaces studied with photoemission and optical spectroscopy
- H. Bernhoff
- D. Purdie
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases
- Gottlieb S. Oehrlein
- Ying Zhang
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Role of ions in reactive ion etching
- J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Deposition of diamondlike carbon using a planar radio frequency induction plasma
- D.L. Pappas
- J. Hod wood
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films