An electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline silicon
- E.A. Irene
- E. Tierney
- et al.
- 2019
- JES
Paper
Publications
509 results at JES
Luminescence of Silica Glasses Containing Copper
- J.M. Brownlow
- I.F. Chang
- 2019
- JES
PaperResolution Limits Of PMMA Resist for Exposure with 50 kV Electrons
- Alec N. Broers
- 2019
- JES
PaperTiO2 Antireflection Coatings by a Low Temperature Spray Process
- H.J. Hovel
- 2019
- JES
PaperParameter Dependence of RIE Induced Radiation Damage in Silicon Dioxide
- L.M. Ephrarh
- D.J. Dimaria
- et al.
- 2019
- JES
PaperOne-Micron Polycide (WSI2 on Poly-Si) MOSFET Technology
- M.Y. Tsai
- H.H. Chao
- et al.
- 2019
- JES
PaperEffect of Plating Parameters on Electrodeposited Nife
- Jean Horkans
- 2019
- JES
PaperOn the Nature of CVD Si-Rich SiO2 and Si3N4 Films
- E.A. Irene
- N.J. Chou
- et al.
- 2019
- JES
PaperAll Dry Lithography Processes and Mechanistic Studies with Poly(methacrylonitrile) and Related Polymers
- H. Hiraoka
- 2019
- JES
PaperThe Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
Paper