All-photoplastic, soft cantilever cassette probe for scanning force microscopy
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- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Publications
14468 results for Physical Sciences
Characterization of line width variation
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- SPIE Advanced Lithography 2000
Conference paperZernike coefficients: Are they really enough?
- C. Progler
- Alfred K. Wong
- 2000
- SPIE Advanced Lithography 2000
Conference paperSynthesis and lithographic performance of poly-4-hydroxyphenyl ethyl methacrylate based negative resists
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- 2000
- Microlithography 2000
Conference paperPatterning of highly conducting polyaniline films
- T. Graham
- A. Afzali
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- 2000
- Microlithography 2000
Conference paper193 nm positive tone bilayer resist based on norbornene-maleic anhydride copolymers
- R. Sooriyakumaran
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- Microlithography 2000
Conference paperDissolution/swelling behavior of cycloolefin polymers in aqueous base
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- R.D. Allen
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- 2000
- Microlithography 2000
Conference paperEffect of resist components on image spreading during postexposure bake of chemically amplified resists
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- F.A. Houle
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- Microlithography 2000
Conference paperToward controlled resist line edge roughness: Material origin of line edge roughness in chemically amplified positive-tone resists
- Q. Lin
- R. Sooriyakumaran
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- 2000
- Microlithography 2000
Conference paperReal-time analysis of volatiles formed during processing of a chemically amplified resist
- F.A. Houle
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- Microlithography 2000
Conference paper