Summary Abstract: Reactive ion-etching-related Si surface residues and subsurface disorderG.S. OehrleinJ.G. Clabeset al.1986JVSTA
Surface processes leading to carbon contamination of photochemically deposited copper filmsF.A. HouleR.J. Wilsonet al.1986JVSTA
Reactive radio frequency sputter deposition of higher nitrides of titanium, zirconium, and hafniumD.S. YeeJ.J. Cuomoet al.1986JVSTA
Reactively sputter-deposited and coevaporated TeOx thin films for optical recordingW.-Y. LeeF.O. Sequedaet al.1986JVSTA
Effect of nucleation layers on the growth and magnetic properties of CoCr and CoCr-X filmsJ.K. Howard1986JVSTA
Time and angle resolved ultraviolet photoemission spectroscopy studies of single crystal surface and interfacesJ. BokorR.R. Freemanet al.1986JVSTA
A simplified scanning tunneling microscope for surface science studiesJ.E. DemuthR.J. Hamerset al.1986JVSTA