The Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorrA. RayA. Reisman2019JES
On the Removal of Insulator Process Induced Radiation Damage from Insulated Gate Field Effect Transistors at Elevated PressureA. ReismanJ.M. Aitkenet al.2019JES
All Dry Lithography Processes and Mechanistic Studies with Poly(methacrylonitrile) and Related PolymersH. Hiraoka2019JES
Radiochemical Analysis of β-Al2O3, and the Preparation of Na-22 Tagged MonocrystalsL.M. FosterJ.E. Scardefield2019JES
Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their EliminationA. ReismanM. Berkenblitet al.2019JES