Resolution Limits Of PMMA Resist for Exposure with 50 kV Electrons
- Alec N. Broers
- 2019
- JES
Paper
Publications
509 results at JES
Titanium Dioxide Films to Improve Photoresist Adhesion
- John C. Marinace
- Ralph C. McGibbon
- 2019
- JES
PaperThe Fabrication of High Precision Nozzles by the Anisotropic Etching of (100) Silicon
- E. Bassous
- E.F. Baran
- 2019
- JES
PaperOn Fitting Error Functions to Data
- R. Ghez
- M.B. Small
- 2019
- JES
PaperElectron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type Resins
- Hiroyuki Hiraoka
- Adolfo R. Gutierrez
- 2019
- JES
PaperTiO2 Antireflection Coatings by a Low Temperature Spray Process
- H.J. Hovel
- 2019
- JES
PaperEffect of Plating Parameters on Electrodeposited Nife
- Jean Horkans
- 2019
- JES
PaperEffects of Several Parameters on the Corrosion Rates of Al Conductors in Integrated Circuits
- Israel Lerner
- Jerome M. Eldridge
- 2019
- JES
PaperThe Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
PaperAnomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their Elimination
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
Paper