Electron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type Resins

Different from photochemical reactions of o-naphthoquinone-diazides characterized by the ketene formation upon the nitrogen removal, electron beam-induced reactions involve not only the nitrogen elimination, but also reactions of substituent groups, thus leading to different types of image formations, positive images from AZ-type resists and negative images from Microline-type resists, although both resists yield optically positive images. The importance of scissions of the substituent groups is shown in the EPR study, and a possible explanation of the different behaviors has been presented based upon mass spectroscopic studies of gaseous products generated during electron beam exposures of these radiation-active compounds. © 1979, The Electrochemical Society, Inc. All rights reserved.