V-6 A Method for the Prevention of the Formation of Dark-Line and Dark-Spot Defects in GaAlAs Double Heterostructure LasersJ.A. Van VechtenJ.M. Blumet al.1976IEEE T-EDPaper
Electrode Flatness Requirements for Cathode Projection Microfabrication SystemsGeorge A. Wardly1975IEEE T-EDPaper
Reduction of Photoresist Standing-Wave Effects by Post-Exposure BakeEdward John Walker1975IEEE T-EDPaper
Characterization of Positive PhotoresistFrederick H. DillWilliam P. Hornbergeret al.1975IEEE T-EDPaper
Modeling Projection Printing of Positive PhotoresistsJames A. TuttleEd ward John Walker1975IEEE T-EDPaper