Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithographyPhilip J. CoaneKaolin G. Chionget al.1993Microlithography 1993Conference paper
Process latitude study of focused ion-beam-deposited gold for clear x-ray mask repairPatricia G. BlaunerAndrew D. Dubneret al.1993Microlithography 1993Conference paper