Summary Abstract: Reactive ion-etching-related Si surface residues and subsurface disorder
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 1986
- JVSTA
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- Materials Discovery
3482 results for Materials Discovery
Langmuir probe characterization of magnetron operation
- H.R. Kaufman
- S.M. Rossnagel
- 1986
- JVSTA
Properties of reactively sputtered tungsten films in nitrogen and oxygen
- K.Y. Ahn
- S.B. Brodskv
- et al.
- 1986
- JVSTA
Solubility of oxygen and sulfur in copper-iron mattes
- D.L. Kaiser
- J.F. Elliott
- 1986
- Metallurgical Transactions B
Low temperature material reaction at the Ti/Si(111) interface
- R.M. Tromp
- G.W. Rubloff
- et al.
- 1986
- JVSTA
Effect of the sintering process on the formation and passivation of PtSi
- H.-C.W. Huang
- F.E. Turene
- et al.
- 1986
- JVSTA
Effect of nucleation layers on the growth and magnetic properties of CoCr and CoCr-X films
- J.K. Howard
- 1986
- JVSTA
Reactive radio frequency sputter deposition of higher nitrides of titanium, zirconium, and hafnium
- D.S. Yee
- J.J. Cuomo
- et al.
- 1986
- JVSTA
Synchrotron-radiation excited carbon is photoemission study of Cr/organic polymer interfaces
- J.L. Jordan
- P.N. Sanda
- et al.
- 1986
- JVSTA
Time and angle resolved ultraviolet photoemission spectroscopy studies of single crystal surface and interfaces
- J. Bokor
- R.R. Freeman
- et al.
- 1986
- JVSTA