A comprehensive evaluation of major phase shift mask technologies for isolated gate sinictuies in logic designs
- Lars W. Liebmann
- Thomas H. Newman
- et al.
- 1994
- Microlithography 1994
Conference paper
Publications
3605 results for Mathematical Sciences
Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
Conference paperMaterials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994
Conference paperRole of residual casting solvent in dissolution behavior of poly (3-methyl-4-hydroxystyrene) films
- Veena Rao
- William D. Hinsberg
- et al.
- 1994
- Microlithography 1994
Conference paper0.25-μm lithography development using positive mode top surface imaging photoresist
- Douglas C. La Tulipe
- John P. Simons
- et al.
- 1994
- Microlithography 1994
Conference paper(1) Recent developments in VUV femtosecond pulse generation; (2) proposal for a higher efficiency F2 (157-nm) laser
- J.H. Glownia
- D.R. Gnass
- et al.
- 1994
- SPIE OE/LASE 1994
Conference paperCan hospitals afford digital storage for imagery?
- W.F. Cody
- H.M. Gladney
- et al.
- 1994
- SPIE Medical Imaging 1994
Conference paperOptoelectronics technology consortium (OETC): Progress andplan
- David K. Lewis
- Philip J. Anthony
- et al.
- 1994
- SPIE OE/LASE 1994
Conference paperUse of scatterometric latent image detector in closed loop feedback control of linewldth
- John Sturtevant
- Steve Holmes
- et al.
- 1994
- Microlithography 1994
Conference paperBounds for the spectrum of normal matrices
- E.R. Barnes
- A.J. Hoffman
- 1994
- Linear Algebra and Its Applications
Paper