Metal-amorphous silicon-silicon tunnel rectifier
- E.S. Yang
- Q.H. Hua
- et al.
- 1984
- Applied Physics Letters
Paper
Publications
2351 results at Applied Physics Letters
Outdiffusion of Si through gold films: The effects of Si orientation, gold deposition techniques and rates, and annealing ambients
- Chin-An Chang
- G. Ottaviani
- 1984
- Applied Physics Letters
PaperOptical stethoscopy: Image recording with resolution λ/20
- D. Pohl
- W. Denk
- et al.
- 1984
- Applied Physics Letters
PaperRapid thermal annealing of boron-implanted silicon using an ultrahigh power arc lamp
- R.T. Hodgson
- V.R. Deline
- et al.
- 1984
- Applied Physics Letters
PaperInteraction in Cu/Al and Pt/Cu/Al thin films: Competing oxygen effects and preferential reaction between Pt and CuAl alloy
- Chin-An Chang
- 1984
- Applied Physics Letters
PaperChanneling in low energy boron ion implantation
- Alwin E. Michel
- R.H. Kastl
- et al.
- 1984
- Applied Physics Letters
PaperRaman spectroscopy of PtSi formation at the Pt/Si(100) interface
- J.C. Tsang
- Y. Yokota
- et al.
- 1984
- Applied Physics Letters
PaperIV curves of long annular Josephson junctions
- A. Davidson
- N.F. Pedersen
- 1984
- Applied Physics Letters
PaperProbing the transition layer at the SiO2-Si interface using core level photoemission
- G. Hollinger
- F.J. Himpsel
- 1984
- Applied Physics Letters
PaperTransient enhanced diffusion in arsenic-implanted short time annealed silicon
- R. Kalish
- T.O. Sedgwick
- et al.
- 1984
- Applied Physics Letters
Paper