Nanolithography at 350 KV in a TEM
- A.N. Broers
- A.E. Timbs
- et al.
- 1989
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
PaperElectron beam lithography of sub-0.1μm circuits
- S. Rishton
- D. Kern
- et al.
- 1989
- Microelectronic Engineering
PaperChemically assisted ion beam etching process for high quality laser mirrors
- P. Buchmann
- H.P. Dietrich
- et al.
- 1989
- Microelectronic Engineering
PaperHigh speed electron beam testing
- George Chiu
- Jean-Marc Halbout
- et al.
- 1989
- Microelectronic Engineering
PaperUsing surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- G. Sauvé
- M. Moisan
- et al.
- 1989
- Microelectronic Engineering
PaperA comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
- E. Babich
- J.M. Shaw
- et al.
- 1987
- Microelectronic Engineering
PaperResist image enhancement by UV-, soft vacuum pulsed electron beams and organometallic compounds
- Hiroyuki Hiraoka
- 1987
- Microelectronic Engineering
PaperThe use of organosilicon polymers in multilayer plasma resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1987
- Microelectronic Engineering
PaperPhotoemission sampling technique for high-speed integrated-circuit testing
- H. Beha
- H.K. Seitz
- et al.
- 1987
- Microelectronic Engineering
Paper