Publications

221 results at Microelectronic Engineering

A comparison of the E-beam sensitivities and relative O₂-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- - E. Babich
  - J. Paraszczak
  - et al.
- 1989
- Microelectronic Engineering
Paper
Fully scaled 0.5 μm MOS circuits by synchrotron radiation X-ray lithography: Devices fabrication and overlay evaluation
- - J. Silverman
  - V. Dimilia
  - et al.
- 1989
- Microelectronic Engineering
Paper
A Single Expose Double Develop (SEDD) process for self-aligned lithographic applications
- - Donis Flagello
  - Andrew Pomerene
- 1989
- Microelectronic Engineering
Paper
X-ray transmission through low atomic number particles
- - R.A. DellaGuardia
  - David Seeger
  - et al.
- 1989
- Microelectronic Engineering
Paper
Highly selective KOH-based etchant for boron-doped silicon structures
- - E. Bassous
  - A.C. Lamberti
- 1989
- Microelectronic Engineering
Paper
Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- - G. Sauvé
  - M. Moisan
  - et al.
- 1989
- Microelectronic Engineering
Paper
Fabrication by tri-level electron beam lithography of X-ray masks with 50nm linewidths, and replication by X-ray nanolithography
- - Erik H. Anderson
  - D. Kern
  - et al.
- 1987
- Microelectronic Engineering
Paper
Photoemission sampling technique for high-speed integrated-circuit testing
- - H. Beha
  - H.K. Seitz
  - et al.
- 1987
- Microelectronic Engineering
Paper
The use of organosilicon polymers in multilayer plasma resist processing
- - J. Paraszczak
  - E. Babich
  - et al.
- 1987
- Microelectronic Engineering
Paper
Resist image enhancement by UV-, soft vacuum pulsed electron beams and organometallic compounds
- - Hiroyuki Hiraoka
- 1987
- Microelectronic Engineering
Paper