Formation of nickel germanides from Ni layers with thickness below 10 nm
- Lukas Jablonka
- Tomas Kubart
- et al.
- 2017
- JVSTB
Paper
Publications
24 results at JVSTB
Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
- Shahab Siddiqui
- Min Dai
- et al.
- 2017
- JVSTB
PaperApplications of clustering model to bimodal distributions for dielectric breakdown
- Ernest Y. Wu
- Ronald Bolam
- et al.
- 2017
- JVSTB
PaperMaterials characterization for multilayer electron beam lithography
- Ravi Bonam
- John G. Hartley
- 2016
- JVSTB
PaperStudy of alternate hardmasks for extreme ultraviolet patterning
- Anuja De Silva
- Indira Seshadri
- et al.
- 2016
- JVSTB
PaperLarge area three dimensional structure fabrication using multilayer electron beam lithography
- Ravi Bonam
- John G. Hartley
- 2016
- JVSTB
PaperHe plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2016
- JVSTB
PaperSIMS measurement of hydrogen and deuterium detection limits in silicon: Comparison of different SIMS instrumentation
- F.A. Stevie
- Chaunzhen Zhou
- et al.
- 2016
- JVSTB
PaperPECVD low and ultralow dielectric constant materials: From invention and research to products
- Alfred Grill
- 2016
- JVSTB
ReviewFormation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2015
- JVSTB
Paper