Correlation of Id- and Ig-random telegraph noise to positive bias temperature instability in scaled high-κ/metal gate n-type MOSFETsChia-Yu ChenQiushi Ranet al.2011IRPS 2011
A robust reliability methodology for accurately predicting Bias Temperature Instability induced circuit performance degradation in HKMG CMOSD.P. IoannouK. Zhaoet al.2011IRPS 2011
Post-breakdown statistics and acceleration characteristics in high-K dielectric stacksErnest WuJordi Suneet al.2011IRPS 2011
Impact of source/drain contact and gate finger spacing on the RF reliability of 45-nm RF nMOSFETsRajan AroraSachin Sethet al.2011IRPS 2011