Co-integration of InGaAs n- and SiGe p-MOSFETs into digital CMOS circuits using hybrid dual-channel ETXOI substratesLukas CzornomazN. Daixet al.2013IEDM 2013
Self-aligned III-V MOSFETs: Towards a CMOS compatible and manufacturable technology solutionY. SunA. Majumdaret al.2013IEDM 2013
2nd Generation dual-channel optimization with cSiGe for 22nm HP technology and beyondC. OrtollandDaniel Jaegeret al.2013IEDM 2013
A time-dependent clustering model for non-uniform dielectric breakdownErnest Y. WuB. Liet al.2013IEDM 2013