Best focus shift mechanism for thick masks
- Martin Burkhardt
- Ananthan Raghunathan
- 2015
- SPIE Advanced Lithography 2015
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24 results at SPIE Advanced Lithography 2015
Fin formation using graphoepitaxy DSA for FinFET device fabrication
- Chi Chun Liu
- Fee Li Lie
- et al.
- 2015
- SPIE Advanced Lithography 2015
Implementation of assist features in EUV lithography
- Fan Jiang
- Martin Burkhardt
- et al.
- 2015
- SPIE Advanced Lithography 2015
Customization and design of directed self-assembly using hybrid prepatterns
- Joy Y. Cheng
- Gregory S. Doerk
- et al.
- 2015
- SPIE Advanced Lithography 2015
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
- Scott D. Halle
- Luciana Meli
- et al.
- 2015
- SPIE Advanced Lithography 2015
Methodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2015
- SPIE Advanced Lithography 2015
Towards production ready processing with a state-of-the-art EUV cluster
- Karen Petrillo
- Nicole Saulnier
- et al.
- 2015
- SPIE Advanced Lithography 2015
Plasma etch challenges with new EUV lithography material introduction for patterning for MOL and BEOL
- Changwoo Lee
- Bhaskar Nagabhirava
- et al.
- 2015
- SPIE Advanced Lithography 2015
Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers
- Eri Hirahara
- Margareta Paunescu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Machine learning and predictive data analytics enabling metrology and process control in IC fabrication
- Narender Rana
- Yunlin Zhang
- et al.
- 2015
- SPIE Advanced Lithography 2015