Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization schemeHsinyu TsaiHiroyuki Miyazoeet al.2014IEDM 2014
A novel inspection and annealing procedure to rejuvenate phase change memory from cycling-induced degradations for storage class memory applicationsWin-San KhwaJau-Yi Wuet al.2014IEDM 2014
First demonstration of high-Ge-content strained-Si1-xGex (x=0.5) on insulator PMOS FinFETs with high hole mobility and aggressively scaled fin dimensions and gate lengths for high-performance applicationsPouya HashemiKarthik Balakrishnanet al.2014IEDM 2014