Characteristics of high performance PFETs with embedded SiGe source/drain and 〈100〉 channels on 45° rotated wafers
- Qiqing Ouyang
- Meikei Ieong
- et al.
- 2005
- VLSI Technology 2005
Conference paper
Publications
18 results at VLSI Technology 2005
Carbon nanotube electronic and optoelectronic devices
- Phaedon Avouris
- 2005
- VLSI Technology 2005
Conference paperA comparative study of NBTI as a function of Si substrate orientation and gate dielectrics (SiON and SiON/HfO 2)
- S. Zafar
- M. Yang
- et al.
- 2005
- VLSI Technology 2005
Conference paperSwitching delay variability in NMOS and PMOS PDSOI passgate circuits
- Mark Ketchen
- Manjul Bhushan
- et al.
- 2005
- VLSI Technology 2005
Conference paperRecent advances in MRAM technology
- W.J. Gallagher
- D.W. Abraham
- et al.
- 2005
- VLSI Technology 2005
Conference paperSRAM Cell Design for Stability Methodology
- Clement Wann
- Robert Wong
- et al.
- 2005
- VLSI Technology 2005
Conference paperA 0.168μm 2/0.11μm 2 highly scalable high performance embedded DRAM cell for 90/65-nm logic applications
- G. Wang
- P. Parries
- et al.
- 2005
- VLSI Technology 2005
Conference paperCompact modeling of FinFETs featuring independent-gate operation mode
- C.-H. Lin
- X. Xi
- et al.
- 2005
- VLSI Technology 2005
Conference paper