Selective epitaxial channel ground plane thin SOI CMOS devices
- Zhibin Ren
- M. Ieong
- et al.
- 2005
- IEDM 2005
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18 results at IEDM 2005
Enabling SOI-based assembly technology for three-dimensional (3D) integrated circuits (ICs)
- A. Topol
- D.C. La Tulipe
- et al.
- 2005
- IEDM 2005
Performance and limitations of 65 nm CMOS for integrated RF power applications
- Jörg Scholvin
- David R. Greenberg
- et al.
- 2005
- IEDM 2005
Carbon nanotube interconnects: Implications for performance, power dissipation and thermal management
- Navin Srivastava
- Rajiv V. Joshi
- et al.
- 2005
- IEDM 2005
Design of high performance PFETs with strained Si channel and laser anneal
- Z. Luo
- Y.F. Chong
- et al.
- 2005
- IEDM 2005
65nm CMOS technology for low power applications
- A. Steegen
- R. Mo
- et al.
- 2005
- IEDM 2005
High performance 65 nm SOI technology with enhanced transistor strain and advanced-low-K BEOL
- W.-H. Lee
- A. Waite
- et al.
- 2005
- IEDM 2005
Fluctuation limits & scaling opportunities for CMOS SRAM cells
- Azeez Bhavnagarwala
- Stephen Kosonocky
- et al.
- 2005
- IEDM 2005