Removal of Fluorocarbon Residues on CF4/H2 Reactive-ion-Etched Silicon Surfaces Using a Hydrogen Plasma
- J. Simko
- G.S. Oehrlein
- et al.
- 2019
- JES
Publications
509 results at JES
Equilibrium Carrier Density and Solubility of Antimony in Silicon
- D. Nobili
- R. Angelucci
- et al.
- 2019
- JES
Various Properties of Sputter-Deposited HfB2 Films
- J.M. Eldridge
- A.R. Forouhi
- et al.
- 2019
- JES
Photochemically Generated Gold Catalyst for Selective Electroless Plating of Copper
- Thomas H. Baum
- 2019
- JES
Chemical vapor deposition of gold
- Carl E. Larson
- Thomas H. Baum
- et al.
- 2019
- JES
Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF4/H2 Plasmas
- W.A. Lanford
- 2019
- JES
Redeposition during Deep Trench Etching
- Jacob Jorne
- 2019
- JES
The electrochemical oxidation and polymerization of polycyclic hydrocarbons
- Joachim Bargon
- A. Diaz
- 2019
- JES
Corrosion Processes in Magneto-optic Films
- M.M. Farrow
- E.E. Marinero
- 2019
- JES
Production and Characterization of Extremely Corrosion Resistant Chromium-Metalloid Alloys
- R.M. Latanision
- R.R. Ruf
- 2019
- JES