Interaction Between ti and SiO2
- C.-Y. Ting
- M. Wittmer
- et al.
- 2019
- JES
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509 results at JES
Optimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes
- S. Mehdizadeh
- J. Dukovic
- et al.
- 2019
- JES
Diffusion of Ion-Implanted Arsenic in Thermally Grown SiO2Films
- D.R. Young
- H. Kräutle
- et al.
- 2019
- JES
Etch Selectivity of Silicon Dioxide over Titanium Silicide Using CF4/H2 Reactive Ion Etching
- Steve W. Robey
- Gottlieb S. Oehrlein
- 2019
- JES
Mechanisms of Electroless Metal Plating: I. Application of the Mixed Potential Theory
- Perminder Bindra
- Judith Tweedie
- 2019
- JES
Submicron epitaxial films
- B. Ginsberg
- G.R. Srinivasan
- 2019
- JES
Process Damage and Contamination Effects for Shallow Si Implanted GaAs
- H. Baratte
- A.J. Fleischman
- et al.
- 2019
- JES
The Properties of electrochromic film electrodes of lanthanide diphthalocyanines in ethylene glycol
- D.J. Schiffrin
- 2019
- JES
XPS Studies on Emersed Silver Electrodes: Coverage and Bonding State of Specifically Adsorbed Chloride
- Wolfgang Kautek
- Joseph G. Gordon
- 2019
- JES
Combined Experimental and Modeling Study of Spatial Effects in Plasma Etching: CF4/O2 Etching of Silicon
- M. Dalvie
- K.F. Jensen
- 2019
- JES