Controlling the peak-to-average power ratio in OFDM-bases wireless-LAN systems
- André Noll Barreto
- 2002
- VTC 2002
Conference paper
Publications
3605 results for Mathematical Sciences
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Conference paperMethodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
Conference paperSensitivity factors of CAR electron beam resists
- David R. Medeiros
- Karen Petrillo
- et al.
- 2002
- Microlithography 2002
Conference paperBuilding high-performance chemically amplified resists with polymer blends
- Qinghuang Lin
- John Simons
- et al.
- 2002
- Microlithography 2002
Conference paperMethods for comparing contact hole shrinking techniques with 248 nm single layer and bilayer photoresists
- Karen Petrillo
- John Simons
- et al.
- 2002
- Microlithography 2002
Conference paperCharacterization of the polymer-developer interface in 193 nm photoresist polymers and formulations during dissolution
- Thomas Wallow
- Wendy Chan
- et al.
- 2002
- Microlithography 2002
Conference paperMultiple Parameter Continuation: Computing Implicitly Defined k-Manifolds
- Michael E. Henderson
- 2002
- IJBC
PaperPACS and electronic health records
- Simona Cohen
- Flora Gilboa
- et al.
- 2002
- SPIE Medical Imaging 2002
Conference paperLearning to annotate video databases
- Milind R. Naphade
- Ching-Yung Lin
- et al.
- 2002
- IS&T/SPIE Electronic Imaging 2002
Conference paper