Formation of Cu3Si and its catalytic effect on silicon oxidation at room temperature
- L. Stolt
- A. Charai
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Magnetization of (100) Cr/Fe/Cr and Pd/Fe/Pd structures
- Chin-An Chang
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Correlation of interface chemistry, barrier height, and step density for Al on vicinal GaAs(100) surfaces
- S. Chang
- I.M. Vitomirov
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Oxygen induced adhesion degradation at metai/polyimide interface
- Da-Yuan Shih
- Nancy Klymko
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
- John B.O. Caughman
- William M. Holber
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Deposition of (100) Au, Ag, Pd, Pt, and Fe on (100) Si using different metal seed layers
- Chin-An Chang
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Thermal stress-induced and electromigration-induced void-open failures in Al and Al-Cu fine lines
- T. Kwok
- K.K. Chan
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Images of a microelectronic device with the X1-SPEM, a first generation scanning photoemission microscope at the National Synchrotron Light Source
- H. Ade
- J. Kirz
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The polarization dependence of Bi-induced surface states on GaAs(110)
- A.B. McLean
- R. Ludeke
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The effects of substrate potentials on electron cyclotron resonance plasmas
- S.M. Rossnagel
- S.J. Whitehair
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films