Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions
- Karen Holloway
- Peter M. Fryer
- et al.
- 1992
- Journal of Applied Physics
Paper
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2360 results at Journal of Applied Physics
Interstitial oxygen reduction in silicon at thermal donor temperatures
- M.P. Guse
- R.L. Kleinhenz
- 1992
- Journal of Applied Physics
PaperThe effect of the flow of silane on the properties of a-Si:H deposited by concentric-electrode radio frequency glow-discharge
- J.P. Conde
- K.K. Chan
- et al.
- 1992
- Journal of Applied Physics
PaperLaser-cleaning techniques for removal of surface particulates
- Andrew C. Tam
- Wing P. Leung
- et al.
- 1992
- Journal of Applied Physics
PaperEffect of multilayer structure and laser pulse width on the reversible cycling of phase change optical storage media
- Kurt A. Rubin
- Dunbar P. Birnie
- et al.
- 1992
- Journal of Applied Physics
PaperDiffusion effects and nucleation of thin film boron nitride growth from borazine on the Si(100) surface
- S. Gates
- C.M. Chiang
- et al.
- 1992
- Journal of Applied Physics
PaperElectromigration-induced vacancy behavior in unpassivated thin films
- J.R. Lloyd
- R.H. Koch
- 1992
- Journal of Applied Physics
PaperElectromigration in two-level interconnect structures with Al alloy lines and W studs
- C.-K. Hu
- P.S. Ho
- et al.
- 1992
- Journal of Applied Physics
PaperPulsed laser deposition of diamond-like carbon films
- David L. Pappas
- Katherine L. Saenger
- et al.
- 1992
- Journal of Applied Physics
PaperRheomagnetic measurements on suspensions of magnetic recording particles
- T.M. Kwon
- M.S. Jhon
- et al.
- 1992
- Journal of Applied Physics
Paper