Modeling of agglomeration in polycrystalline thin films: Application to TiSi2 on a silicon substrate
- T.P. Nolan
- R. Sinclair
- et al.
- 1992
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Chemical and electrical properties of interfaces between deposited insulators and La2CuO4
- A. Levy
- M.J. Lercel
- et al.
- 1992
- Journal of Applied Physics
PaperElectromigration in two-level interconnect structures with Al alloy lines and W studs
- C.-K. Hu
- P.S. Ho
- et al.
- 1992
- Journal of Applied Physics
PaperDeposition of amorphous silicon using a tubular reactor with concentric-electrode confinement
- J.P. Conde
- K.K. Chan
- et al.
- 1992
- Journal of Applied Physics
PaperThe chemisorption and reaction of BCl3 with Si(111)
- D.A. Lapiano-Smith
- F.R. McFeely
- 1992
- Journal of Applied Physics
PaperSome electrical properties of amorphous silicon/amorphous silicon nitride interfaces: Top nitride and bottom nitride configurations in MNS and TFT devices
- C. Godet
- Jerzy Kanicki
- et al.
- 1992
- Journal of Applied Physics
PaperApplication of disjoining and capillary pressure to liquid lubricant films in magnetic recording
- C. Mathew Mate
- 1992
- Journal of Applied Physics
PaperDiffusion barrier properties of TiN films for submicron silicon bipolar technologies
- E. Kobeda
- J. Warnock
- et al.
- 1992
- Journal of Applied Physics
PaperTransmission studies of explosive vaporization of a transparent liquid film on an opaque solid surface induced by excimer-laser-pulsed irradiation
- P.T. Leung
- Nhan Do
- et al.
- 1992
- Journal of Applied Physics
PaperKinetic analysis of C49-TiSi2 and C54-TiSi2 formation at rapid thermal annealing rates
- L. Clevenger
- J.M.E. Harper
- et al.
- 1992
- Journal of Applied Physics
Paper