Assessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paper
Publications
3605 results for Mathematical Sciences
Optimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperIBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
Conference paper193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
Conference paperHigh speed, lateral PIN photodiodes in silicon technologies
- Jeremy D. Schaub
- Steven J. Koester
- et al.
- 2004
- SPIE IOPTO 2004
Conference paperModeling for profile-based process-window metrology
- Christopher P. Ausschnitt
- Shaunee Y. Cheng
- 2004
- Microlithography 2004
Conference paperTaming pattern and focus variation in VLSI design
- Fook-Luen Heng
- Puneet Gupta
- et al.
- 2004
- AMM 2004
Conference paperMerits of cellwise model-based OPC
- Puneet Gupta
- Fook-Luen Heng
- et al.
- 2004
- AMM 2004
Conference paperManufacturing-aware design methodologies for mixed-signal communication circuits
- Juan Antonio Carballo
- Sani Nassif
- 2004
- AMM 2004
Conference paperImage fidelity verification - ContourIFV
- Ioana Graur
- Rama N. Singh
- et al.
- 2004
- AMM 2004
Conference paper