IBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
Publications
3593 results for Mathematical Sciences
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
High speed, lateral PIN photodiodes in silicon technologies
- Jeremy D. Schaub
- Steven J. Koester
- et al.
- 2004
- SPIE IOPTO 2004
Modeling for profile-based process-window metrology
- Christopher P. Ausschnitt
- Shaunee Y. Cheng
- 2004
- Microlithography 2004
Taming pattern and focus variation in VLSI design
- Fook-Luen Heng
- Puneet Gupta
- et al.
- 2004
- AMM 2004
Image fidelity verification - ContourIFV
- Ioana Graur
- Rama N. Singh
- et al.
- 2004
- AMM 2004
Merits of cellwise model-based OPC
- Puneet Gupta
- Fook-Luen Heng
- et al.
- 2004
- AMM 2004
Manufacturing-aware design methodologies for mixed-signal communication circuits
- Juan Antonio Carballo
- Sani Nassif
- 2004
- AMM 2004
High-performance circuit design for the RET-enabled 65nm technology node
- Lars Liebmann
- Arnold Barish
- et al.
- 2004
- AMM 2004
Min-up/min-down polytopes
- Jon Lee
- Janny Leung
- et al.
- 2004
- Discrete Optimization