Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paper
Publications
3605 results for Mathematical Sciences
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperIBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
Conference paperSurface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Conference paperCombinatorial resist processing studies
- Carl E. Larson
- Gregory M. Wallraff
- 2004
- Microlithography 2004
Conference paperMesoscale modeling for SFIL simulating polymerization kinetics and densification
- Ryan L. Burns
- Stephen C. Johnson
- et al.
- 2004
- Microlithography 2004
Conference paperDeep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperRinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Conference paperAssessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperOptimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paper