Finite-element stress analysis of failure mechanisms in a multilevel metallization structure
- L.T. Shi
- K.N. Tu
- 1995
- Journal of Applied Physics
Publications
2360 results at Journal of Applied Physics
Hydrogen incorporation in silicon nitride films deposited by remote electron-cyclotron-resonance chemical vapor deposition
- David E. Kotecki
- Jonathan D. Chapple-Sokol
- 1995
- Journal of Applied Physics
Role of the chamber wall in low-pressure high-density etching plasmas
- James A. O'Neill
- Jyothi Singh
- 1995
- Journal of Applied Physics
Interface states induced by the presence of trapped holes near the silicon-silicon-dioxide interface
- D.J. DiMaria
- D.A. Buchanan
- et al.
- 1995
- Journal of Applied Physics
Near-threshold laser sputtering of gold
- Ted D. Bennett
- Costas P. Grigoropoulos
- et al.
- 1995
- Journal of Applied Physics
Stoichiometry reversal in the growth of thin oxynitride films on Si(100) surfaces
- D.G.J. Sutherland
- H. Akatsu
- et al.
- 1995
- Journal of Applied Physics
Understanding hot-electron transport in silicon devices: Is there a shortcut?
- M.V. Fischetti
- S.E. Laux
- et al.
- 1995
- Journal of Applied Physics
Defects generated by Fowler-Nordheim injection in silicon dioxide films produced by plasma-enhanced chemical-vapour deposition with nitrous oxide and silane
- D. Landheer
- Y. Tao
- et al.
- 1995
- Journal of Applied Physics
Mechanism for stress-induced leakage currents in thin silicon dioxide films
- D.J. Dimaria
- E. Cartier
- 1995
- Journal of Applied Physics
Properties of amorphous diamond films prepared by a filtered cathodic arc
- Richard Lossy
- David L. Pappas
- et al.
- 1995
- Journal of Applied Physics