Publications

3543 results for Mathematical Sciences

Characterization of imaging performance for immersion lithography at NA=0.93
- - Dario Gil
  - Jaione Tirapu-Azpiroz
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Dissolution fundamentals of 193-nm methacrylate based photoresists
- - Ashwin Rao
  - Shuhui Kang
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Vinyl ether resist system for UV-cured nanoimprint lithography
- - Hiroshi Ito
  - Frances A. Houle
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Direct determination of photoresist composition changes during UV exposure
- - Frances A. Houle
  - Vaughn R. Deline
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Phase calibration for attenuating phase-shift masks
- - Michael S. Hibbs
  - Timothy A. Brunner
- 2006
- SPIE Advanced Lithography 2006
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- - Patrick P. Naulleau
  - Clemens Rammeloo
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Self assembly in semiconductor microelectronics: Self-aligned sub-lithographic patterning using diblock copolymer thin films
- - C.T. Black
  - R. Ruiz
- 2006
- SPIE Advanced Lithography 2006
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- - William Hinsberg
  - Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Silicon containing polymer in applications for 193 nm high NA lithography processes
- - Scan Bums
  - Dirk Pfeiffer
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Characterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- - W. Chu
  - C. Radens
  - et al.
- 2006
- SPIE Advanced Lithography 2006