Summary Abstract: Investigation of the interface chemistry of titanium-tungsten Schottky barrier contacts to silicon by Auger spectroscopy
- J.E. Lewis
- M.O. Aboelfotoh
- et al.
- 1985
- JVSTA
Paper
Publications
176 results at JVSTA
Chemical reactions at Pt/oxide/Si and Ti/oxide/Si interfaces
- M. Liehr
- F.K. LeGoues
- et al.
- 1985
- JVSTA
PaperStress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation
- D.S. Yee
- J. Floro
- et al.
- 1985
- JVSTA
PaperSummary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couples
- H.-O. Blom
- S. Berg
- et al.
- 1985
- JVSTA
PaperSecondary electron effect on power-voltage relationship in rf sputtering
- B. Bumble
- J.J. Cuomo
- 1985
- JVSTA
PaperFormation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films
- E.D. Adams
- K.Y. Ahn
- et al.
- 1985
- JVSTA
PaperCharacterization of electron-beam deposited tungsten films on sapphire and silicon
- J.H. Souk
- J.F. O'Hanlon
- et al.
- 1985
- JVSTA
PaperElectron-gun Evaporators of Refractory Metals Compatible with Molecular Beam Epitaxy
- M. Heiblum
- J. Bloch
- et al.
- 1985
- JVSTA
PaperRaman Spectroscopy of Silicide Formation at the Pt/Crystalline Si Interface
- J.C. Tsang
- G.W. Rubloff
- et al.
- 1984
- JVSTA
PaperHomogeneous chemical vapor deposition
- B.A. Scott
- W.L. Olbricht
- et al.
- 1984
- JVSTA
Paper