The Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
Publications
509 results at JES
Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists
- Ivan Haller
- Ralph Feder
- et al.
- 2019
- JES
Etching Silicon with Fluorine Gas
- M. Chen
- V.J. Minkiewicz
- et al.
- 2019
- JES
Effects of Conductor Stress on Bubble Propagation in Contiguous Disk Devices
- K.Y. Ahn
- S.M. Kane
- 2019
- JES
The Controlled Etching of Silicon in Catalyzed Ethylenediamine-Pyrocatechol-Water Solutions
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
Titanium Dioxide Films to Improve Photoresist Adhesion
- John C. Marinace
- Ralph C. McGibbon
- 2019
- JES
AZ1350J as a Deep-U.V. Mask Material
- B.J. Lin
- 2019
- JES
On the Nature of Fixed Oxide Charge
- S.I. Raider
- A. Berman
- 2019
- JES
Combined Experimental and Modeling Study of Spatial Effects in Plasma Etching: CF4/O2 Etching of Silicon
- M. Dalvie
- K.F. Jensen
- 2019
- JES
Optimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes
- S. Mehdizadeh
- J. Dukovic
- et al.
- 2019
- JES