Self-aligned, self-assembled organosilicate line patterns of ∼20nm half-pitch from block copolymer mediated self-assembly
- Ho-Cheol Kim
- Joy Cheng
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
Publications
3605 results for Mathematical Sciences
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperContact angles & structure/surface property relationships of immersion materials 65191Q
- Linda K. Sundberg
- Daniel P. Sanders
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperFuture directions for CMOS device technology development from a system application perspective
- Tak H. Ning
- 2007
- SPIE Advanced Lithography 2007
Conference paperDistinguishing dose, focus and blur for lithography characterization and control
- Christopher P. Ausschnitt
- Timothy A. Brunner
- 2007
- SPIE Advanced Lithography 2007
Conference paperHigh performance 193nm photoresists based on fluorosulfonamide
- Wenjie Li
- Kuang-Jung Chen
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperOPC model data collection for 45nm technology node using automatic CD-SEM offline recipe creation
- Daniel Fischer
- Mohamed Talbi
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperCoupling-aware mixed dummy metal insertion for lithography
- Liang Deng
- Martin D.F. Wong
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperA solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography
- Andrew J. Merriam
- Donald S. Bethune
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperSetting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- Ian Stobert
- James Bruce
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper