A solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography
- Andrew J. Merriam
- Donald S. Bethune
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
Publications
3611 results for Mathematical Sciences
Self-aligned, self-assembled organosilicate line patterns of ∼20nm half-pitch from block copolymer mediated self-assembly
- Ho-Cheol Kim
- Joy Cheng
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperOPC model data collection for 45nm technology node using automatic CD-SEM offline recipe creation
- Daniel Fischer
- Mohamed Talbi
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperImproving the power-performance of multicore processors through optimization of lithography and thermal processing
- A. Gabor
- T.A. Brunner
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperFluoroalcohol materials with tailored interfacial properties for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperDistinguishing dose, focus and blur for lithography characterization and control
- Christopher P. Ausschnitt
- Timothy A. Brunner
- 2007
- SPIE Advanced Lithography 2007
Conference paperContact angles & structure/surface property relationships of immersion materials 65191Q
- Linda K. Sundberg
- Daniel P. Sanders
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperBuilding an immersion top coat from the ground up - Materials perspective
- Mahmoud Khojasteh
- Irene Popova
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperFuture directions for CMOS device technology development from a system application perspective
- Tak H. Ning
- 2007
- SPIE Advanced Lithography 2007
Conference paperUse of starburst patterns in optical lithography
- M. Burkhardt
- Cyrus Tabery
- 2007
- SPIE Advanced Lithography 2007
Conference paper