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- Francisco Curbera
- Rania Khalaf
- et al.
- 2003
- Communications of the ACM
Review
Publications
26856 results for Science
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
Conference paperRational design in cyclic olefin resists for sub-100nm lithography
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2003
- Microlithography 2003
Conference paperChemical ordering of FePt nanoparticle self-assemblies by rapid thermal annealing
- H. Zeng
- Shouheng Sun
- et al.
- 2003
- Journal of Magnetism and Magnetic Materials
Conference paperHardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperA model for lubricant flow from disk to slider
- B. Marchon
- T. Karls
- et al.
- 2003
- INTERMAG 2003
Conference paperToward an understanding of overcoat corrosion protection
- Qing Dai
- Bing Yen
- et al.
- 2003
- INTERMAG 2003
Conference paperDeprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Conference paperTime evolution of lubricant-slider dynamic interactions
- Q. Dai
- B. Knigge
- et al.
- 2003
- INTERMAG 2003
Conference paperDiffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Conference paper