Challenges and progress in x-ray lithography
- Jerome P. Silverman
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Accuracy and efficiency in electron beam proximity effect correction
- S.J. Wind
- P.D. Gerber
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperInteraction between gas rarefaction and metal ionization in ionized physical vapor deposition
- S.M. Rossnagel
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperEtching processes and characteristics for the fabrication of refractory x-ray masks
- Michael J. Lercel
- Cameron J. Brooks
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperFabrication of Cu interconnects of 50 nm linewidth by electron-beam lithography and high-density plasma etching
- Y. Hsu
- T. Standaert
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperComparison of secondary ion mass spectrometry profiling of sub-100 nm ultrashallow junctions using NO+2 and O+2 sputtering
- P.A. Ronsheim
- K.L. Lee
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
ReviewDirectional and ionized physical vapor deposition for microelectronics applications
- S.M. Rossnagel
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
ReviewInvestigation of existing defects and defect generation in device-grade SiO2 by ballistic electron emission spectroscopy
- H.J. Wen
- R. Ludeke
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperElectromigration behavior of hot-sputtered Al(Cu) versus chemical vapor deposition W vias
- R. Filippi
- E.N. Levine
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperLow energy electron beam top surface image processing using chemically amplified AXT resist
- C.S. Whelan
- D.M. Tanenbaum
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper