Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications
- Karen Petrillo
- James Bucchignano
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator
- R.C. Tiberio
- D.W. Carr
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Directional copper deposition using dc magnetron self-sputtering
- Zbigniew J. Radzimski
- Witold M. Posadowski
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Experimental demonstration of the validity of accelerated radiation damage testing of x-ray mask materials
- R.E. Acosta
- R. Rippstein
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Etching processes and characteristics for the fabrication of refractory x-ray masks
- Michael J. Lercel
- Cameron J. Brooks
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Comparison of secondary ion mass spectrometry profiling of sub-100 nm ultrashallow junctions using NO+2 and O+2 sputtering
- P.A. Ronsheim
- K.L. Lee
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Directional and ionized physical vapor deposition for microelectronics applications
- S.M. Rossnagel
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Investigation of existing defects and defect generation in device-grade SiO2 by ballistic electron emission spectroscopy
- H.J. Wen
- R. Ludeke
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
X-ray lithography: Status, challenges, and outlook for 0.13 μm
- Jerome P. Silverman
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
New complimentary metal-oxide semiconductor technology with self-aligned Schottky source/drain and low-resistance T gates
- S. Rishton
- K. Ismail
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures