Chemical reactions at Pt/oxide/Si and Ti/oxide/Si interfaces
- M. Liehr
- F.K. LeGoues
- et al.
- 1985
- JVSTA
Publications
176 results at JVSTA
Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation
- D.S. Yee
- J. Floro
- et al.
- 1985
- JVSTA
Summary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couples
- H.-O. Blom
- S. Berg
- et al.
- 1985
- JVSTA
Secondary electron effect on power-voltage relationship in rf sputtering
- B. Bumble
- J.J. Cuomo
- 1985
- JVSTA
Formation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films
- E.D. Adams
- K.Y. Ahn
- et al.
- 1985
- JVSTA
Characterization of electron-beam deposited tungsten films on sapphire and silicon
- J.H. Souk
- J.F. O'Hanlon
- et al.
- 1985
- JVSTA
Thermal desorption spectroscopy of Xe at the Si(111) as a local probe for surface structures
- J.W. Bartha
- U. Barjenbruch
- et al.
- 1985
- JVSTA
Summary Abstract: Comparison between the adsorption of PH3 and B2H6 on Si surfaces as related to the CVD of Si
- M.L. Yu
- D.J. Vitkavage
- et al.
- 1985
- JVSTA
The etching of W(111) with XeF2
- Harold F. Winters
- 1985
- JVSTA
Adsorbate-surface and adsorbate-adsorbate interactions and their role in surface reactions
- N.D. Lanq
- 1985
- JVSTA