Summary Abstract: Investigation of the interface chemistry of titanium-tungsten Schottky barrier contacts to silicon by Auger spectroscopy
- J.E. Lewis
- M.O. Aboelfotoh
- et al.
- 1985
- JVSTA
Paper
Publications
176 results at JVSTA
Chemical reactions at Pt/oxide/Si and Ti/oxide/Si interfaces
- M. Liehr
- F.K. LeGoues
- et al.
- 1985
- JVSTA
PaperStress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation
- D.S. Yee
- J. Floro
- et al.
- 1985
- JVSTA
PaperSummary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couples
- H.-O. Blom
- S. Berg
- et al.
- 1985
- JVSTA
PaperSecondary electron effect on power-voltage relationship in rf sputtering
- B. Bumble
- J.J. Cuomo
- 1985
- JVSTA
PaperFormation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films
- E.D. Adams
- K.Y. Ahn
- et al.
- 1985
- JVSTA
PaperCharacterization of electron-beam deposited tungsten films on sapphire and silicon
- J.H. Souk
- J.F. O'Hanlon
- et al.
- 1985
- JVSTA
PaperThermal desorption spectroscopy of Xe at the Si(111) as a local probe for surface structures
- J.W. Bartha
- U. Barjenbruch
- et al.
- 1985
- JVSTA
PaperSummary Abstract: Comparison between the adsorption of PH3 and B2H6 on Si surfaces as related to the CVD of Si
- M.L. Yu
- D.J. Vitkavage
- et al.
- 1985
- JVSTA
PaperThe etching of W(111) with XeF2
- Harold F. Winters
- 1985
- JVSTA
Paper