Poly(Methyl Methacrylate-isobutylene) Copolymers as Highly Sensitive Electron Beam Resists
- Edward Gipstein
- Wayne Moreau
- et al.
- 2019
- JES
Paper
Publications
19 results for W.M. Moreau
Azide photoresists for projection photolithography
- N.J. Clecak
- R.J. Cox
- et al.
- 2004
- Polymer Engineering & Science
PaperCurrent Developments of a High Performance CA Resist for Mask Making Application
- Wu-Song Huang
- Wei He
- et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
Conference paperThe synthesis and evaluation of cyclic olefin sulfone copolymers and terpolymers as electron beam resists
- Edward Gipstein
- Wayne Moreau
- et al.
- 2003
- Journal of Applied Polymer Science
PaperEnhancement of KRS-XE for 50 keV advanced mask making applications
- Karen Petrillo
- David Medeiros
- et al.
- 2002
- SPIE Photomask Technology 2002
Conference paperEarly mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Conference paperSensitivity factors of CAR electron beam resists
- David R. Medeiros
- Karen Petrillo
- et al.
- 2002
- Microlithography 2002
Conference paperApplication of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
PaperA high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperHigh resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper