Publications

19 results for W.M. Moreau

Poly(Methyl Methacrylate-isobutylene) Copolymers as Highly Sensitive Electron Beam Resists
- - Edward Gipstein
  - Wayne Moreau
  - et al.
- 2019
- JES
Azide photoresists for projection photolithography
- - N.J. Clecak
  - R.J. Cox
  - et al.
- 2004
- Polymer Engineering & Science
Current Developments of a High Performance CA Resist for Mask Making Application
- - Wu-Song Huang
  - Wei He
  - et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
The synthesis and evaluation of cyclic olefin sulfone copolymers and terpolymers as electron beam resists
- - Edward Gipstein
  - Wayne Moreau
  - et al.
- 2003
- Journal of Applied Polymer Science
Enhancement of KRS-XE for 50 keV advanced mask making applications
- - Karen Petrillo
  - David Medeiros
  - et al.
- 2002
- SPIE Photomask Technology 2002
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- - Christina Deverich
  - Andrew Watts
  - et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Sensitivity factors of CAR electron beam resists
- - David R. Medeiros
  - Karen Petrillo
  - et al.
- 2002
- Microlithography 2002
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High resolution patterning in chemically amplified resists: The effect of film thickness
- - David R. Medeiros
  - Wayne M. Moreau
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering