In-line Raman spectroscopy for gate-all-around nanosheet device manufacturing
- Daniel Schmidt
- Curtis Durfee
- et al.
- 2022
- JM3
Paper
Publications
19 results for Aron Cepler
Advanced EUV Resist Characterization using Scatterometry and Machine Learning
- Daniel Schmidt
- Karen Petrillo
- et al.
- 2021
- ASMC 2021
Conference paperIn-line Raman spectroscopy for stacked nanosheet device manufacturing
- Daniel Schmidt
- C. Durfee
- et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paperOCD enhanced: Implementation and validation of spectral interferometry for nanosheet inner spacer indentation
- Daniel Schmidt
- C. Durfee
- et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paperDevelopment of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
- Dexin Kong
- Daniel Schmidt
- et al.
- 2020
- ASMC 2020
Conference paperMeasuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- Dexin Kong
- Daniel Schmidt
- et al.
- 2020
- SPIE Advanced Lithography 2020
Conference paperAdvanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)
- R. Muthinti
- Nicolas Loubet
- et al.
- 2016
- SPIE Advanced Lithography 2016
Conference paperAdvanced in-line metrology strategy for self-aligned quadruple patterning
- Robin Chao
- Mary Breton
- et al.
- 2016
- SPIE Advanced Lithography 2016
Conference paperScatterometry-based defect detection for DSA in-line process control
- Robin Chao
- Chi Chun Liu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper