Publications

17 results for Aron Cepler

Metrology-Design Co-Optimization for BEOL dimensional characterization using scatterometry
- - Stefan Schoeche
  - Daniel Schmidt
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps
- - Padraig Timoney
  - Stefan Schoeche
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Spectral Interferometry for TSV Metrology in Chiplet Technology
- - Stefan Schoeche
  - Daniel Schmidt
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Spectral interferometry for fully integrated device metrology
- - Daniel Schmidt
  - Manasa Medikonda
  - et al.
- 2023
- JM3
TSV Stress Evolution Mapping using in-line Raman Spectroscopy
- - Stefan Schoeche
  - Daniel Schmidt
  - et al.
- 2023
- SPIE Advanced Lithography + Patterning 2023
Vertical Travelling Scatterometry for Metrology on Fully Integrated Devices
- - D. Schmidt
  - Manasa Medikonda
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Scatterometry based methodologies for characterization of MRAM technology
- - Manasa Medikonda
  - Daniel Schmidt
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement
- - Daniel Schmidt
  - Aron Cepler
  - et al.
- 2022
- IEEE Trans Semicond Manuf
In-line Raman spectroscopy for gate-all-around nanosheet device manufacturing
- - Daniel Schmidt
  - Curtis Durfee
  - et al.
- 2022
- JM3
Advanced EUV Resist Characterization using Scatterometry and Machine Learning
- - Daniel Schmidt
  - Karen Petrillo
  - et al.
- 2021
- ASMC 2021