Publications

72 results for G.W. Rubloff

Exciton transport in SiO₂ as a possible cause of surface-state generation in MOS structures
- - Z.A. Weinberg
  - G.W. Rubloff
- 2008
- Applied Physics Letters
Exciton or hydrogen diffusion in SiO₂?
- - Z.A. Weinberg
  - D.R. Young
  - et al.
- 2008
- Journal of Applied Physics
Thin-film transformations and volatile products in the formation of nanoporous low- k polymethylsilsesquioxane-based dielectric
- - P. Lazzeri
  - L. Vanzetti
  - et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
ToF-SIMS studies of nanoporous PMSSQ materials: Kinetics and reactions in the processing of low-K dielectrics for ULSI applications
- - P. Lazzeri
  - G.W. Rubloff
  - et al.
- 2004
- Surface and Interface Analysis
Role of gas phase reactions in subatmospheric chemical-vapor deposition ozone/TEOS processes for oxide deposition
- - I.A. Shareef
  - G.W. Rubloff
  - et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Subatmospheric chemical vapor deposition ozone/TEOS process for SiO₂ trench filling
- - I.A. Shareef
  - G.W. Rubloff
  - et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Role of implantation-induced defects in surface-oriented diffusion of fluorine in silicon
- - Cs. Szeles
  - B. Nielsen
  - et al.
- 1994
- Journal of Applied Physics
Integrated Processing of MOS Gate Dielectric Structures
- - G.W. Rubloff
  - M. Offenberg
  - et al.
- 1994
- IEEE Trans Semicond Manuf
Chemical vapor deposition of rough-morphology silicon films over a broad temperature range
- - S.S. Dana
  - M. Anderle
  - et al.
- 1993
- Applied Physics Letters
Positron annihilation at the Si/SiO₂ interface
- - T.C. Leung
  - Z.A. Weinberg
  - et al.
- 1992
- Journal of Applied Physics