The estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Publications
85 results for Frances A. Houle
Use of interferometric lithography to characterize the spatial resolution of a photoresist film
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- J. Photopolym. Sci. Tech.
High numerical aperture lithographic imagery at the Brewster angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Method of measuring the spatial resolution of a photoresist
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 2002
- Optics Letters
Kinetic model for positive tone resist dissolution and roughening
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Macromolecules
Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2002
- Journal of Physical Chemistry A
Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Visible laser-induced nucleation and growth of Cr, Mo, and W films from the hexacarbonyls. Reactivity of CO on film surfaces
- F.A. Houle
- K.A. Singmaster
- 2002
- Journal of Physical Chemistry
High numerical aperture-imaging implications for chemically amplified photoresists
- Martha I. Sanchez
- Frances A. Houle
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
EUV photoresist performance results from the VNL and the EUV LLC
- Jonathan Cobb
- Paul Dentinger
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering