Characterization of volatile species formed during exposure of photoresists to ultraviolet light
- F.A. Houle
- V.R. Deline
- et al.
- 2007
- Macromolecules
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85 results for Frances A. Houle
Adhesion between template materials and UV-cured nanoimprint resists
- F.A. Houle
- Eric Guyer
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Antiadhesion considerations for UV nanoimprint lithography
- F.A. Houle
- C.T. Rettner
- et al.
- 2007
- Applied Physics Letters
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- J. Photopolym. Sci. Tech.
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Vinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
Adhesion between template materials and UV-cured nanoimprint resists
- Frances A. Houle
- Eric Guyer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Direct determination of photoresist composition changes during UV exposure
- Frances A. Houle
- Vaughn R. Deline
- et al.
- 2006
- SPIE Advanced Lithography 2006
Numeric analysis of the role of liquid phase ultraviolet photochemistry in 193 nm immersion lithography
- William Hinsberg
- Frances Houle
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005