Boron migration due to annealing in CoFeB/MgO/CoFeB interfaces: A combined hard x-ray photoelectron spectroscopy and x-ray absorption studies
- Abdul K. Rumaiz
- C. Jaye
- et al.
- 2011
- Applied Physics Letters
Paper
Publications
8 results for D.A. Fischer
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
- Vivek M. Prabhu
- Sharadha Sambasivan
- et al.
- 2006
- Applied Surface Science
PaperX-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2005
- Langmuir
PaperSurface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Conference paperNear edge x-ray absorption fine structure measurements of surface segregation in 157 nm photoresist blends
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Conference paperX-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003
Conference paperProbing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure
- Joseph L. Lenhart
- Ronald L. Jones
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperSurface extended x-ray-absorption fine structure of low-Z adsorbates studied with fluorescence detection
- J. Stöhr
- E.B. Kollin
- et al.
- 1985
- Physical Review Letters
Paper