Publications

94 results for Fenton R. McFeely

Summary Abstract: Theoretical investigations of fluorine-silicon systems
- - Chris G. Van de Walle
  - Y. Bar-Yam
  - et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Dielectrics on semiconductors
- - F.J. Himpsel
  - U.O. Karlsson
  - et al.
- 1988
- Materials Science and Engineering B
Oxygen removal from Si via reaction with adsorbed Ge
- - J.F. Morar
  - B.S. Meyerson
  - et al.
- 1987
- Applied Physics Letters
MODEL SYSTEMS IN THE STUDY OF ETCHING MECHANISMS.
- - F.R. McFeely
  - J.F. Morar
  - et al.
- 1986
- Symposium on Plasma Processing 1986
Mechanism of ion-assisted etching of silicon by fluorine atoms
- - J.A. Yarmoff
  - F.R. McFeely
- 1987
- Surface Science
Electronic structure of the CaF2/Si(111) interface
- - D. Rieger
  - F.J. Himpsel
  - et al.
- 1986
- Physical Review B
Formation of a new ordered structure of CaF2/Si(111) by ultraviolet irradiation
- - U.O. Karlsson
  - F.J. Himpsel
  - et al.
- 1986
- Physical Review Letters
C 1s excitation studies of diamond (111). I. Surface core levels
- - J.F. Morar
  - F.J. Himpsel
  - et al.
- 1986
- Physical Review B
C 1s excitation studies of diamond (111). II. Unoccupied surface states
- - J.F. Morar
  - F.J. Himpsel
  - et al.
- 1986
- Physical Review B
Structure and bonding at the CaF₂/Si (111) interface
- - F.J. Himpsel
  - F.U. Hillebrecht
  - et al.
- 1986
- Applied Physics Letters