Publications

13 results for J.-H. Ku

Stress proximity technique for performance improvement with dual stress liner at 45nm technology and beyond
- - X. Chen
  - S. Fang
  - et al.
- 2006
- VLSI Technology 2006
65nm CMOS technology for low power applications
- - A. Steegen
  - R. Mo
  - et al.
- 2005
- IEDM 2005
High performance and low power transistors integrated in 65nm bulk CMOS technology
- - Z. Luo
  - A. Steegen
  - et al.
- 2004
- IEDM 2004