Publications

15 results for Mark Slezak

Optimization of pitch-split double patterning phoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- ASMC 2011
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fabrication of dual damascene BEOL structures using a multi-level multiple exposure (MLME) scheme - Part 2. RIE-based pattern transfer and completion of dual damascene process yielding an electrically functional via chain
- - Stefan Harrer
  - John C Arnold
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Process characterization of pitch-split resist materials for application at 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Fabrication of dual damascene BEOL structures using a Multi-Level Multiple Exposure (MLME) scheme - Part 1. Lithographic patterning
- - Dario L. Goldfarb
  - Stefan Harrer
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
High performance 193nm photoresists based on fluorosulfonamide
- - Wenjie Li
  - Kuang-Jung Chen
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Building an immersion top coat from the ground up - Materials perspective
- - Mahmoud Khojasteh
  - Irene Popova
  - et al.
- 2007
- SPIE Advanced Lithography 2007
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- Microlithography 2005
Progress towards developing high performance immersion compatible materials and processes
- - Karen Petrillo
  - Kaushal Patel
  - et al.
- 2005
- Microlithography 2005
Design of protective topcoats for immersion lithography
- - Robert D. Allen
  - Phillip J. Brock
  - et al.
- 2005
- J. Photopolym. Sci. Tech.