Publications

26 results for Ranee Kwong

Development of KrF hybrid resist for a dual isolation application
- - Sen Liu
  - Steven Holmes
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- - Qinghuang Lin
  - Alshakim Nelson
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Patternable low-κ material for "greener" semiconductor manufacturing
- - Qinghuang Lin
  - Shyng-Tsong Chen
  - et al.
- 2010
- ICSICT 2010
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- - Qinghuang Lin
  - Shyng-Tsong Chen
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Integration of photo-patternable low-κ material into advanced Cu back-end-of-the-line
- - Qinghuang Lin
  - Alshakim Nelson
  - et al.
- 2010
- Japanese Journal of Applied Physics
Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- - P.R. Varanasi
  - W. Li
  - et al.
- 2007
- J. Photopolym. Sci. Tech.
High performance 193nm photoresists based on fluorosulfonamide
- - Wenjie Li
  - Kuang-Jung Chen
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Progress towards developing high performance immersion compatible materials and processes
- - Karen Petrillo
  - Kaushal Patel
  - et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- Microlithography 2005
Fluoroalcohol-methacrylate resists for 193nm lithography
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.