Publications

13 results for Jason Meiring

22nm technology yield optimization using multivariate 3D virtual fabrication
- - B. Cipriany
  - B. Jagannathan
  - et al.
- 2013
- SISPAD 2013
Enabling reverse tone imaging for via levels using attenuated Phase Shift Mask and source optimization
- - Bassem Hamieh
  - Hyun Chol Choi
  - et al.
- 2013
- SPIE Advanced Lithography 2013
High performance bulk planar 20nm CMOS technology for low power mobile applications
- - Huiling Shang
  - Sameer Jain
  - et al.
- 2012
- VLSI Technology 2012
Applicability of global source mask optimization to 22/20nm node and beyond
- - Kehan Tian
  - Moutaz Fakhry
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- - David Melville
  - Alan E. Rosenbluth
  - et al.
- 2010
- SPIE Advanced Lithography 2010
22-nm-node technology active-layer patterning for planar transistor devices
- - Ryoung-Han Kim
  - Steven Holmes
  - et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
22 nm technology node active layer patterning for planar transistor devices
- - Ryoung-Han Kim
  - Steven Holmes
  - et al.
- 2009
- SPIE Advanced Lithography 2009
32 NM Logic patterning options with immersion lithography
- - K. Lai
  - S. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008
The comparison of OPC performance and run time for dense versus sparse solutions
- - Amr Abdo
  - Ian Stobert
  - et al.
- 2008
- SPIE Advanced Lithography 2008